The required utility resources are significantly larger for EUV compared to
193 nm immersion, even with two exposures using the latter. At the 2009 EUV Symposium,
Hynix reported that the wall plug efficiency was ~0.02% for EUV, i.e., to get 200-watts at intermediate focus for 100 wafers-per-hour, one would require 1-megawatt of input power, compared to 165-kilowatts for an ArF immersion scanner, and that even at the same throughput, the footprint of the EUV scanner was ~3× the footprint of an ArF immersion scanner, resulting in productivity loss.